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You searched for “swagelok”

Aluminum › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4003	Trimethylaluminum, min. 98%, 93-1360, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	75-24-1
98-4004	Trimethylaluminum, min. 98%, 93-1360, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	75-24-1
98-4008	Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	75-24-1
98-4007	Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	75-24-1

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98-4003 75-24-1	98-4004 75-24-1	98-4008 75-24-1
98-4007 75-24-1

Cylinders (CVD/ALD) & Adapters › Other

Catalog Number		Description	CAS Number
View Structures
96-1070		Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Ball Valve and Female Nut for CVD/ALD
96-1071		Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Bellows-Sealed Valve (High Temp) and Female Nut for CVD/ALD
96-1075		Swagelok® Cylinder Assembly, 50ml with 1/4” VCR Male Ball Valve and Female Nut, electropolished for CVD/ALD
96-1076		Swagelok® Cylinder Assembly, 50ml with 1/4” VCR Male Bellows-Sealed Valve (High Temp) and Female Nut, electropolished for CVD/ALD
96-1077		Swagelok® Cylinder Assembly, 50ml with 1/4'' VCR Male DP Valve (Ultra High Purity) and Female Nut, electropolished for CVD/ALD
96-1078		Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male DP high pressure Valve (High Purity), PCTFE seat, VCR Metal Gasket Seal Fitting, Round Handle, electropolished for CVD/ALD
96-8500		Swagelok® Type I Adapter
96-8501		Swagelok® Type II Adapter

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96-1070	96-1071	96-1075
96-1076	96-1077	96-1078
96-8500	96-8501

Gallium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4068	Trimethylgallium, 99+%, 31-2000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	1445-79-0
98-4047	Trimethylgallium, elec. gr. (99.9999%-Ga) PURATREM, 98-2000, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	1445-79-0

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98-4068 1445-79-0	98-4047 1445-79-0

Hafnium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4021	Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	19782-68-4
98-4022	Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok® cylinder (96-1071) for CVD/ALD	19782-68-4
98-4048	Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) TEMAH, PURATREM, 72-7720, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	352535-01-4

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98-4021 19782-68-4	98-4022 19782-68-4	98-4048 352535-01-4

Indium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4054	Cyclopentadienylindium(I), elec. gr. (99.99+%-In) PURATREM, 97-3425, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	34822-89-4
98-4057	Cyclopentadienylindium (I), elec. gr. (99.99+%-In) PURATREM, 97-3425, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	34822-89-4
98-4056	Trimethylindium, elec. gr. (99.999%-In) PURATREM, 98-2010, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	3385-78-2

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98-4054 34822-89-4	98-4057 34822-89-4	98-4056 3385-78-2

Magnesium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4006	Bis(ethylcyclopentadienyl)magnesium, min. 98%, 12-0510, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	114460-02-5
98-4010	Bis(ethylcyclopentadienyl)magnesium, min. 98%, 12-0510, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	114460-02-5
98-4069	Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium, anhydrous, min. 98% [Mg(TMHD)2] , 12-0900, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	21361-35-3

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98-4006 114460-02-5	98-4010 114460-02-5	98-4069 21361-35-3

Manganese › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4060	Bis(cyclopentadienyl)manganese, 98+%, 25-0200, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	73138-26-8
98-4065	Bis(ethylcyclopentadienyl)manganese, min. 98%, 25-0210, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	101923-26-6

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98-4060 73138-26-8	98-4065 101923-26-6

Oxygen › Compounds

Catalog Number		Description	CAS Number
View Structures
98-8000		Water, 99.999% (PURATREM), 98-0295, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	7732-18-5

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98-8000 7732-18-5

Platinum › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4024	(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	94442-22-5
98-4026	(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok® cylinder high temperature valve (96-1071) for CVD/ALD	94442-22-5

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98-4024 94442-22-5	98-4026 94442-22-5

Ruthenium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4009	Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), 44-0040, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	32992-96-4
98-4067	Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), 44-0040, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	32992-96-4

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98-4009 32992-96-4	98-4067 32992-96-4

Silicon › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4036	3-Aminopropyltriethoxysilane, 98%, 93-1402, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	919-30-2
98-4037	3-Aminopropyltriethoxysilane, 98%, 93-1402, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	919-30-2
98-4027	Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM, 98-0147, contained in a 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	10026-04-7
98-6025	Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 ml Swagelok® cylinder (96-1077) for CVD/ALD	18166-43-3
98-4035	Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	15112-89-7

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98-4036 919-30-2	98-4037 919-30-2	98-4027 10026-04-7
98-6025 18166-43-3	98-4035 15112-89-7

Tantalum › Compounds

Catalog Number		Description	CAS Number
View Structures
98-4045		t-Butylimidotris(dimethylamino)tantalum(V), min. 98%, 73-0700, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	69039-11-8

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98-4045 69039-11-8

Tin › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4052	N,N'-Di-t-butyl-2,3-diamidobutanetin(II), 98%, 50-1150, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	1268357-44-3
98-4050	Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM, 50-1815, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	1066-77-9

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98-4052 1268357-44-3	98-4050 1066-77-9

Titanium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4043	Tetrakis(diethylamino)titanium(IV), 99%, 22-1050, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	4419-47-0
98-4015	Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, 93-2240, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	3275-24-9
98-4016	Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, 93-2240, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	3275-24-9
98-4033	Titanium(IV) chloride, 99%, 22-1150, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	7550-45-0
98-4030	Titanium(IV) i-propoxide, min. 98%, 93-2216, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	546-68-9

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98-4043 4419-47-0	98-4015 3275-24-9	98-4016 3275-24-9
98-4033 7550-45-0	98-4030 546-68-9

Yttrium › Compounds

Catalog Number		Description	CAS Number
View Structures
98-4018		Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), min. 98% (99.9%-Y) (REO), 39-1500, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	41836-28-6

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98-4018 41836-28-6

Zinc › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4000	Diethylzinc, min. 95%, 93-3030, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	557-20-0
98-4005	Diethylzinc, min. 95%, 93-3030, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD	557-20-0
98-4001	Dimethylzinc, 99%, 97-5061, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	544-97-8
98-4002	Dimethylzinc, elec. gr. (99.999%-Zn) PURATREM, 97-5060, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD	544-97-8

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98-4000 557-20-0	98-4005 557-20-0	98-4001 544-97-8
98-4002 544-97-8

Zirconium › Compounds

Catalog Number	Description	CAS Number
View Structures
98-4042	Tetrakis(dimethylamino)zirconium(IV), 98% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml Swagelok® cylinder (96-1070) for CVD/ALD	19756-04-8
98-4012	Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, 40-4100, contained in 50 ml Swagelok® cylinder for (96-1070) CVD/ALD	19756-04-8
98-4039	Tetrakis(ethylmethylamino)zirconium(IV) 99% TEMAZ, 40-1710, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	175923-04-3

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98-4042 19756-04-8	98-4012 19756-04-8	98-4039 175923-04-3

Product Resources › Documents

Resource Title	Link
Chemical Vapor Deposition/Atomic Layer Deposition (CVD/ALD) Precursors contained in Swagelok® Cylinders	View
Cylinders and Adapters	View
Cylinders and Adapters	View

Product Blogs › Documents

Blog Title	Link
22nd International Conference on Atomic Layer Deposition (ALD 2022)	View
Volatile ALD & CVD Magnesium Precursors for Non-volatile Memory and Flexible Display Applications	View
Ytterbium Precursors for ALD Growth Applications in the Fabrication of Advanced Optical and Electrical Devices	View
PEALD processes employing Strem supplied TDMASn precursor presented by diverse groups of researchers	View
A New Yttrium Amidinate Precursor for the ALD growth of Oxide Thin Films for Advanced Electronic Applications	View
2019 MRS Fall Meeting & Exhibit	View
Tin (II) Amidinate Shows Potential as an ALD Precursor for Microelectronic and Optical Applications	View
V2019- Vakuum & Plasma Conference	View
A Scandium Source for ALD of Thin Film Oxides	View
Strem offers Hafnium Metal Alkylamide ALD Precursors for Emerging Memory Applications	View
Strem’s High Purity Liquid Ruthenium Precursor for Emerging ALD and CVD Applications	View
CVD/ALD Bubblers & Ampoules for R&D and High-Volume Manufacturing	View
Estimating Rising Demand for Ru Thin-films in the Next Generation Chips	View
The AVS 65th International Symposium & Exhibition begins next week!	View
Countdown to ALD 2018!	View
Atomic Layer Deposition of Platinum Thin Films - Current and Future Applications	View
A Volatile Manganese Precursor for ALD & CVD, 25-0230: Bis(N,N'-di-i-propylpentylamidinato)manganese(II)	View
95-3000: New Bubbler for CVD/ALD	View
Electropolished Stainless Steel Cylinders and Adapters for ALD Precursors	View

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