Product Resources
Literature Sheets - CVD, ALD Precursors and Equipment
Chemical Vapor Deposition/Atomic Layer Deposition (CVD/ALD) Precursors contained in Swagelok® Cylinders 
Chemical Vapor Deposition/Atomic Layer Deposition (CVD/ALD) Precursors contained in Swagelok® Cylinders
CVD/ALD Precursor for Iron Oxide Films
26-1640 Bis(hexafluoroacetylacetonato)(N,N,N',N'-tetramethylethylenediamine)iron(II), min. 98%
Cylinders and Adapters
96-1070: Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Ball Valve and Female Nut for CVD/ALD
96-1071: Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Bellows-Sealed Valve (High Temp) and Female Nut for CVD/ALD
96-1075: Swagelok® Cylinder Assembly, 50ml with 1/4 VCR Male Ball Valve and Female Nut, electropolished for CVD/ALD
96-1076: Swagelok® Cylinder Assembly, 50ml with 1/4 VCR Male Bellows-Sealed Valve (High Temp) and Female Nut, electropolished for CVD/ALD
96-1077: Swagelok® Cylinder Assembly, 50ml with 1/4'' VCR Male DP Valve (Ultra High Purity) and Female Nut, electropolished for CVD/ALD
96-1078: Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male DP high pressure Valve (High Purity), PCTFE seat, VCR Metal Gasket Seal Fitting, Round Handle, electropolished for CVD/ALD
95-4154: Stainless steel cylinder, 200ml, single vertical stem, electropolished with fill-port, PCTFE valve stem tip, DOT 4B
95-0281: Stainless steel cylinder, 125ml, horizontal in line, with angled Bellows valve (150°C), DOT 4B
Electropolished Stainless Steel Bubblers - Vertical and Horizontal
High temperature valves also available.
Thin Film Deposition- Precursors, equipment & services
We offer reliable high purity specialty chemicals for research and development, as well as
commercial scale applications. Our CVD/ALD precursors, equipment and related services are used
in microelectronics, semiconductors and many related applications.
