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High-Performance Precursors for CVD & ALD
99% to 99.9999% Metals Purity
Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) allows ultra-thin films to be deposited in a precisely controlled way. We currently offer over 500 metal precursors for CVD/ALD applications from over 60 different elements. Many of these compounds are also available in electronic grade suitable for semiconductor applications.
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