Focused electron beam induced deposition (FEBID) is a method to grow free-standing, three-dimensional metal nanostructures in a scanning electron microscope (SEM). The electron beam provides the necessary energy for the decomposition of the precursor in contrast to thermal decomposition used for other chemical vapor deposition (CVD) processes. However, as in every CVD process it requires a volatile compound to serve as the metal source.
Table of content graphic in reference 1 (J. Am. Chem. Soc. 2016, 138, 9172)
Fig. 1. Schematic of Pt deposition by FEBID using [Pt(CO)2Cl2].
As a nanoscale direct writing technique, FEBID can be used for a huge variety of metals including Co, Fe, Pt, Au and Ru. The major challenge lies with the deposition of pure metal, which depends strongly on the metal precursor. An ideal FEBID precursor decomposes fully yielding a pure metal deposit and avoids carbon incorporation. [Pt(CO)2Cl2] serves these requirements as a superior alternative to [MeCpPtMe3] yielding ultimately almost 100 % purity [1-3].
Additionally, catalytically active Pt nanoparticles can be synthesized from adsorbed precursor on silica was reduces with water vapor. [4]
References:
FEATURED PRODUCT:
78-0550: cis-Dichlorodicarbonylplatinum(II), (99.9%-Pt) (25478-60-8)
RELATED PRODUCT LINES:
High Purity Chemicals for Materials R&D
Halides for CVD & ALD
Metal Carbonyls for CVD & ALD
Metal Chloride