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Co(CO)3NO, a Versatile CVD Precursor (Catalog # 27-0500)

Compared to dicobalt octacarbonyl, cobalt tricarbonyl nitrosyl demonstrates improved thermal stability under vacuum storage

Co(CO)3NO, Cobalt tricarbonyl nitrosyl (CAS #14096-82-3, catalog #27-0500) is a compound that has been produced and sold by Strem Chemicals for many years. Due to the introduction of new technologies in the microelectronic industries, the demand for this material as a CVD precursor has grown.

The material is a dense liquid (d = 1.47g/cm3) at ambient temperature, with a melting point of -1°C and a boiling point of just 50°C. Therefore, it has a very high vapor pressure and shows an intense red color in all three phases.

 27-0500

The product is neither miscible nor reactive with water. However, it is very miscible with most organic solvents. This material is used in CVD applications for the deposition of films by laser, electron beam and ion beam.

References:

  1. U.S. Pat. Appl. Publ., 2009, US 20090269507 A1 20091029
  2. Microelectronic Engineering, 2011, 88(8), 1955-1958
  3. Angewandte Chemie, International Edition, 2011, 50(40), 9475-9477
  4. Journal of Physical Chemistry C, 2011, 115(40), 19606-19611
  5. Chemical Vapor Deposition, 2011, 17(7-8-9), 211-220
  6. Beilstein Journal of Nanotechnology, 2014, 5, 1175-1185
  7. Journal of Photopolymer Science and Technology, 2014, 27(4), 477-483

 

Product mentioned in this blog:

27-0500: Cobalt tricarbonyl nitrosyl, CAS # 14096-82-3

 

Visit the links below to view other precursors on our website and related literature:

Precursors for CVD & ALD listed on our website

MOCVD, CVD & ALD Precursors booklet

 

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