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You searched for “cvd/ald
Close Section Aluminum › Compounds
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Catalog Number   Description CAS Number
96-8100 96-8100
Brass ball valve (Type II)
96-8105 96-8105
Brass needle valve (Type I)
96-8000 96-8000
Cylinder, carbon steel, 275ml
96-8005 96-8005
Cylinder, carbon steel, 900ml
96-0900 96-0900
Enzymatic Flow Reactor (2.5 inch tube x 0.25 inch I.D.)
95-4154 95-4154
Stainless steel cylinder, 200ml, single vertical stem, electropolished with fill-port, PCTFE valve stem tip, DOT 4B
96-1070 96-1070
Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Ball Valve and Female Nut for CVD/ALD
96-1071 96-1071
Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male Bellows-Sealed Valve (High Temp) and Female Nut for CVD/ALD
96-1075  
Swagelok® Cylinder Assembly, 50ml with 1/4” VCR Male Ball Valve and Female Nut, electropolished for CVD/ALD
96-1076  
Swagelok® Cylinder Assembly, 50ml with 1/4” VCR Male Bellows-Sealed Valve (High Temp) and Female Nut, electropolished for CVD/ALD
96-1077 96-1077
Swagelok® Cylinder Assembly, 50ml with 1/4'' VCR Male DP Valve (Ultra High Purity) and Female Nut, electropolished for CVD/ALD
96-1078  
Swagelok® Cylinder Assembly, 50ml with 1/4" VCR Male DP high pressure Valve (High Purity), PCTFE seat, VCR Metal Gasket Seal Fitting, Round Handle, electropolished for CVD/ALD
95-0281 95-0281
Stainless steel cylinder, 125ml, horizontal in line, with angled Bellows valve (150°C), DOT 4B
96-8500 96-8500
Swagelok® Type I Adapter
96-8501 96-8501
Swagelok® Type II Adapter
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Close Section Gallium › Compounds
Close Section Hafnium › Compounds
Close Section Indium › Compounds
Close Section Lead › Compounds
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Catalog Number   Description CAS Number
82-2155 82-2155
Bis(1-dimethylamino-2-methyl-2-propanolate)lead(II), 98% Pb(DMAMP)2 934302-16-6
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Close Section Magnesium › Compounds
Close Section Manganese › Compounds
Close Section Oxygen › Compounds
Close Section Platinum › Compounds
Close Section Ruthenium › Compounds
Close Section Silicon › Compounds
Close Section Tantalum › Compounds
Close Section Tin › Compounds
Close Section Titanium › Compounds
Close Section Yttrium › Compounds
Close Section Zinc › Compounds
Close Section Zirconium › Compounds
Close Section Product Resources › Documents
Close Section Product Blogs › Documents
Blog Title Link
2nd International Conference on Noncovalent Interactions
22nd International Conference on Atomic Layer Deposition (ALD 2022)
High-Performance Precursors for CVD & ALD
New Magnesium Amidinate for CVD and ALD Applications
Chemistry Made for What Matters
Gadolinium Precursor for ALD and CVD of Oxide and Nitride Thin Films
Ruthenium Precursor for Focused Electron Beam Induced Deposition 44-5150
A New Lithium Precursor Is Available As An ALD Source For Li Films With Applications In Battery Technology
High Purity Chemicals for Materials R&D
Volatile ALD & CVD Magnesium Precursors for Non-volatile Memory and Flexible Display Applications
High Purity Precursors for CVD/ALD
Lanthanum and Lutetium Amidinate Precursors are Used to Grow Desirable High-k Ternary Oxides by Atomic Layer Deposition
Ytterbium Precursors for ALD Growth Applications in the Fabrication of Advanced Optical and Electrical Devices
PEALD processes employing Strem supplied TDMASn precursor presented by diverse groups of researchers
A New Yttrium Amidinate Precursor for the ALD growth of Oxide Thin Films for Advanced Electronic Applications
2019 MRS Fall Meeting & Exhibit
Tin (II) Amidinate Shows Potential as an ALD Precursor for Microelectronic and Optical Applications
AVS 66th International Symposium & Exhibition 2019
V2019- Vakuum & Plasma Conference
A Scandium Source for ALD of Thin Film Oxides
2019 Fall ACS National Meeting & Expo
Strem offers Hafnium Metal Alkylamide ALD Precursors for Emerging Memory Applications
We are leaving on a jet plane…
Clang Clang Clang went the Trolly
Luxembourg is our next stop!
Next stop Québec, Canada!
Hold onto your hats!
Strem’s High Purity Liquid Ruthenium Precursor for Emerging ALD and CVD Applications
All that Glitters isn’t Gold...but this Precursor Is!
CVD/ALD Bubblers & Ampoules for R&D and High-Volume Manufacturing
Estimating Rising Demand for Ru Thin-films in the Next Generation Chips
The AVS 65th International Symposium & Exhibition begins next week!
Countdown to ALD 2018!
Atomic Layer Deposition of Platinum Thin Films - Current and Future Applications
Novel Precursor for CVD/ALD of Ruthenium Containing Films
Volatile Palladium Complexes Without Halogen or Heteroatoms for CVD / ALD and Catalysis
We will be exhibiting at ALD2017!
A Volatile Manganese Precursor for ALD & CVD, 25-0230: Bis(N,N'-di-i-propylpentylamidinato)manganese(II)
95-3000: New Bubbler for CVD/ALD
Electropolished Stainless Steel Cylinders and Adapters for ALD Precursors
Request the Strem Chemicals Catalog Bulk Quote Request Get Quarterly Updates by Email

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