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You searched for “copper
Close Section Ammonium › Compounds
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Catalog Number   Description CAS Number
93-2902  
Ammonium copper(II) chloride dihydrate 10060-13-6
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Close Section Carbon › Elemental forms
Catalog Number   Description Color & Form CAS Number
06-0274 06-0274
Graphene film, monolayer, on copper foil (1cm x 1cm) foil 1034343-98-0
Close Section Copper › Compounds
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Catalog Number   Description CAS Number
29-7050 29-7050
μ-Benzenebis[N,N'-(1,3-dimethyl-1,3-propanediylidene)bis(2,6-
dichlorobenzenaminato)] dicopper(I), benzene adduct, min. 98%
1119821-62-3
29-0225 29-0225
Copper(I) bromide, dimethyl sulfide complex, 99% 54678-23-8
29-5515 29-5515
Trifluoromethylthiolato(2,2-bipyridine)copper(I), 97% 1413732-47-4
29-5001 29-5001
All New
Copper(II) trifluoromethanesulfonate, 99% (99.9%-Cu) (Copper triflate) 34946-82-2
29-3050 29-3050
All New
Copper benzene-1,3,5-tricarboxylate MOF, HKUST-1(Cu) 51937-85-0
29-8500 29-8500
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 550nm ± 10nm, QY > 75% 927198-36-5
29-8510 29-8510
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 590nm ± 10nm, QY > 75% 927198-36-5
29-8520 29-8520
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 630nm ± 10nm, QY > 75% 927198-36-5
29-8530 29-8530
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 680nm ± 10nm, QY > 75% 927198-36-5
29-8540 29-8540
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 800nm ± 10nm, QY > 75% 927198-36-5
29-8550 29-8550
All New
Copper Indium Disulfide/Zinc Sulfide Quantum Dots, Peak Emission 950nm ± 10nm, QY > 75% 927198-36-5
29-2907 29-2907
All New
Copper(I) bromide (99.99%-Cu) PURATREM 7787-70-4
29-7110 29-7110
Bis(t-butylacetoacetato)copper(II), 99% 23670-45-3
29-7100 29-7100
Bis(N,N'-di-sec-butylacetamidinato)dicopper(I), 99% 695188-31-9
29-3015 29-3015
Bis(1,4-diazabicyclo[2.2.2]octane)tetra(copper(I) iodide) (CuI)4(DABCO)2 928170-42-7
29-3007 29-3007
Bis{[1-(2R,5R)-2,5-diethylphospholanyl]-[2-(2R,5R)-2,5-diethylphospholanyl-
1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97%
29-3008 29-3008
Bis{[1-(2S,5S)-2,5-diethylphospholanyl]-[2-(2S,5S)-2,5-diethylphospholanyl-
1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97%
29-3002 29-3002
Bis{[1-(2R,5R)-2,5-dimethylphospholanyl]-[2-(2R,5R)-2,5-
dimethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97%
874013-62-4
29-7120 29-7120
Bis(dimethylamino-2-propoxy)copper(II), min. 97% Cu(dmap)2 185827-91-2
29-3003 29-3003
Bis{[1-(2S,5S)-2,5-dimethylphospholanyl]-[2-(2S,5S)-2,5-
dimethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97%
29-0550 29-0550
Bis(N,N'-dimethylpiperazine)tetra[copper(I) iodide], 98% MOF 1401708-91-5
29-8400 29-8400
Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)copper(II) [Cu(FOD)2] 80289-21-0
29-3000 29-3000
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% [Cu(TMHD)2] 14040-05-2
29-3100 29-3100
Bis(triphenylphosphine)copper(I) nitrate, 99% 106678-35-7
29-4000 29-4000
Bromo(1,10-phenanthroline)(triphenylphosphine)copper(I), min. 97% 25753-84-8
29-4050 29-4050
Chloro[1,3-bis(2,6-di-i-propylphenyl)imidazol-2-ylidene]copper(I), 98% 578743-87-0
93-2989 93-2989
Copper(I) acetate, 97% 598-54-9
93-2988 93-2988
Copper(II) acetate, anhydrous, min. 97% 142-71-2
93-2901 93-2901
Copper(II) acetate monohydrate, 98+% (ACS) 6046-93-1
93-2968 93-2968
Copper(II) acetylacetonate, 98+% 13395-16-9
93-2907 93-2907
Copper(I) bromide, min. 98% 7787-70-4
93-2908 93-2908
Copper(II) bromide, 99% 7789-45-9
93-2909 93-2909
Copper(II) i-butyrate, 99% 15432-56-1
93-2911 93-2911
Copper(II) carbonate, basic 12069-69-1
93-2914 93-2914
Copper(I) chloride, anhydrous, 97+% 7758-89-6
29-0360 29-0360
Copper(I) chloride (99.99%-Cu) PURATREM 7758-89-6
93-2912 93-2912
Copper(II) chloride, anhydrous, min. 98% 7447-39-4
93-2913 93-2913
Copper(II) chloride dihydrate, 99+% (ACS) 10125-13-0
93-2985 93-2985
Copper(II) chloride dihydrate (99.999%-Cu) PURATREM 10125-13-0
29-0410  
Copper chromite, barium promoted (62-64% Cr2CuO4, 22-24% CuO, 6%BaO, 0-4% Graphite, 1% CrO3, 1% Cr2O3) 12018-10-9
93-2916 93-2916
Copper(I) cyanide, 99% 544-92-3
93-2920 93-2920
Copper(II) ethylacetoacetate, 99% 14284-06-1
29-2941 29-2941
Copper(II) 2-ethylhexanoate (solvent free - 16-19% Cu) 149-11-1
93-2923 93-2923
Copper(II) fluoride, anhydrous, 99% 7789-19-7
93-2925 93-2925
Copper(II) formate hydrate 544-19-4
93-2927 93-2927
Copper(II) gluconate, min. 98% 13005-35-1
29-2928 29-2928
Copper(II) hexafluoroacetylacetonate, anhydrous, elec. gr. (99.99+%-Cu) PURATREM 14781-45-4
93-2929 93-2929
Copper(II) hexafluoroacetylacetonate hydrate 14781-45-4
29-2929 29-2929
Copper(II) hexafluoroacetylacetonate hydrate, elec. gr. (99.99+%-Cu) PURATREM 14781-45-4
93-2936 93-2936
Copper(I) iodide, 98% 7681-65-4
29-0485 29-0485
Copper(I) iodide (99.999%-Cu) PURATREM 7681-65-4
29-0490 29-0490
Copper(I) iodide/cesium carbonate admixture [5.50 wt% CuI] 7681-65-4
29-0500 29-0500
Copper(II) methoxide, 99% 1184-54-9
29-6750 29-6750
Copper (II) naphthenate mineral spirits (8% Cu) 1338-02-9
29-7000 29-7000
Copper(II) neodecanoate, superconductor grade, ~60% in toluene (6-12% Cu) 50315-14-5
93-2939 93-2939
Copper(II) nitrate trihydrate, 99.5% 10031-43-3
93-2940 93-2940
Copper(II) nitrate trihydrate (99.999%-Cu) PURATREM 10031-43-3
93-2942 93-2942
Copper(II) oxalate hemihydrate 55671-32-4
93-2944 93-2944
Copper(I) oxide, min. 95% 1317-39-1
93-2981 93-2981
Copper(I) oxide (99.9%-Cu) 1317-39-1
93-2943 93-2943
Copper(II) oxide, min. 97% (99+%-Cu) 1317-38-0
29-2945 29-2945
Copper(II) oxide (99.5+%-Cu) 1317-38-0
29-0590 29-0590
Copper(II) oxide (99.995%-Cu) PURATREM 1317-38-0
93-2947 93-2947
Copper(II) perchlorate hexahydrate, 98+% 10294-46-9
29-0595 29-0595
Copper(I) phenylacetylide, min. 97% 13146-23-1
93-2948 93-2948
Copper(II) phthalocyanine 147-14-8
93-2957 93-2957
Copper(II) sulfate, anhydrous, 98% 7758-98-7
93-2958 93-2958
Copper(II) sulfate pentahydrate, 98+% (ACS) 7758-99-8
93-2959 93-2959
Copper(II) sulfate pentahydrate (99.999%-Cu) PURATREM 7758-99-8
93-2960 93-2960
Copper(I) sulfide (99.5%-Cu) 22205-45-4
29-2969 29-2969
Copper(II) sulfide (99.5%-Cu) 1317-40-4
93-2961 93-2961
Copper(II) tartrate hydrate 815-82-7
93-2963 93-2963
Copper(II) tetrafluoroborate hydrate, 99% 207121-39-9
93-2964 93-2964
Copper(I) thiocyanate, 99% 1111-67-7
93-2966 93-2966
Copper(II) trifluoroacetylacetonate, 97+% 14324-82-4
29-5000 29-5000
Copper(II) trifluoromethanesulfonate, 98% (Copper triflate) 34946-82-2
29-5500 29-5500
Cyclopentadienyl(triethylphosphine)copper(I), min. 98% 12261-30-2
29-0565 29-0565
(Hexamethylenetetramine)penta[copper(I) cyanide], 98% MOF 1042093-98-0
29-5550 29-5550
Mesitylcopper(I), min. 95% 75732-01-3
29-6000 29-6000
(1,10-Phenanthroline)bis(triphenylphosphine)copper(I) nitrate dichloromethane adduct, 98% 33989-10-5
29-6600 29-6600
Tetraamminecopper(II) sulfate hydrate 14283-05-7
29-6700 29-6700
Tetrakis(acetonitrile)copper(I) hexafluorophosphate, 98+% 64443-05-6
29-6720 29-6720
Trifluoromethyl(1,10-phenanthroline)copper(I), 95% Trifluoromethylator® 1300746-79-5
29-2955 29-2955
Tris(triphenylphosphine)(trifluoromethyl)copper(I), 99% 325810-07-9
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Close Section Copper › Elemental forms
Close Section Kits › Compounds
Close Section Lithium › Compounds
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Catalog Number   Description CAS Number
03-4500 03-4500
Lithium tetrachlorocuprate, 0.1M in THF 15489-27-7
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Close Section Metals Scavenging Agents › Compounds
Close Section Nanomaterials › Elemental forms
Close Section Phosphorus › Compounds
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Catalog Number   Description CAS Number
15-1260 15-1260
[2-(N,N-Dimethylamino)phenyl]di-t-butylphosphine, min. 95% 415941-58-1
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Close Section Tech Notes › Documents
Catalog Number   Description CAS Number
71-1050 71-1050
Tris(N,N'-di-i-propylacetamidinato)lutetium(III), 99%
06-0355 06-0355
All New
Monolayer High Strength Metallurgical Graphene, HSMG®, on PMMA (25x25 mm) 1034343-98-0
06-0365 06-0365
All New
Monolayer High Strength Metallurgical Graphene, HSMG®, on GLASS (10x10 mm) 1034343-98-0
05-1015 05-1015
Tetrahydroxydiboron, min. 95% 13675-18-8
78-3035 78-3035
Platinum nanoparticles, 30% on carbon black (surfactant and reactant-free) 7440-06-4
44-2812 44-2812
Ruthenium nanoparticles, pure, (<20nm) in acetone at 100mg/L (surfactant and reactant-free) 7440-18-8
07-1235 07-1235
(4S,4'S)-2,2'-(1,3-Bis[4-(t-butyl)phenyl)propane-2,2-diyl]bis(4-phenyl-4,
5-dihydrooxazole) (S)-BTBBPh-SaBOX
1428328-51-1
15-6435 15-6435
All New
(2R,2'R,3R,3'R)-3,3'-Di-tert-butyl-2,2'-dimethyl-2,2',3,3'-
tetrahydro-4,4'-bibenzo[d][1,3]oxaphosphole, min. 97% (99% ee) (2R,2'R,3R,3'R)-DI-Me-BABIBOP
2214207-74-4
View   Nanoparticles via Laser Ablation  
View   Strem Chemicals, Inc.  
15-6445 15-6445
All New
(2R,2'R,3R,3'R)-3,3'-Di-tert-butyl-2,2'-diisopropyl-2,2',3,3'-
tetrahydro-4,4'-bibenzo[d][1,3]oxaphosphole, min. 97% (99% ee) (2R,2'R,3R,3'R)-DI-iPr-BABIBOP
2214207-75-5
78-3026 78-3026
Platinum nanoparticles, 10% on Titania (anatase) (surfactant and reactant-free) 7440-06-4
View   Nanoparticles via Laser Ablation  
79-0416 79-0416
Gold nanoparticles, pure, (<20nm) in isopropanol at 100mg/L (surfactant and reactant-free) 7440-57-5
07-0472 07-0472
4,7-Diphenyl-1,10-phenanthroline, 99% (Bathophenanthroline) 1662-01-7
96-3730  
1,1'-Bis(dialkyl/diarylphosphino)ferrocene Ligand Kit
79-0921 79-0921
Gold nanoparticles, 1% on carbon black (surfactant and reactant-free) 7440-57-5
22-0192 22-0192
Titanium nanoparticles, pure, (<20nm) in acetone at 100mg/L (surfactant and reactant-free) 7440-32-6
07-1923 07-1923
4,7-Dimethoxy-1,10-phenanthroline, 98% 92149-07-0
Close Section Product Resources › Documents
Close Section Product Blogs › Documents
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Chiral Phosphoramidite Ligands for Asymmetric Synthesis
Palladium
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New Challenges and Applications with our Carbon Nanotubes
Industrial Utility of Metal Naphthenates
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Trifluoromethylator®
Strem’s High Purity Liquid Ruthenium Precursor for Emerging ALD and CVD Applications
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Metal Naphthenates Used for a Variety of Applications
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We are Proud to Announce Our Distribution Agreement with UbiQD for Cadmium-Free Quantum Dots
High Strength Metallurgical Graphene (HSMG®) Sheets
Novel Precursor for CVD/ALD of Ruthenium Containing Films
Phospha-alkene Bidentate Ligand for Transition Metal Catalysis
New Ligand Design Made Possible through Bis-oxazoline Ligands Modified with Side Arms (SaBOX)
A Volatile Manganese Precursor for ALD & CVD, 25-0230: Bis(N,N'-di-i-propylpentylamidinato)manganese(II)
Metal Organic Frameworks (MOFs) with Copper Based Building Units
Laser Ablation — An Effective Preparative Method for Nanoparticles
Families of Volatile Metal Precursors from Roy Gordon’s Group at Harvard University for Use in ALD Applications
Monolayer Graphene on Copper Substrate, 06-0274, Available from Strem Chemicals, Inc.
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