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You searched for “Metal Amidinates
Close Section Calcium › Compounds
Close Section Cobalt › Compounds
Close Section Copper › Compounds
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Catalog Number   Description CAS Number
29-7100 29-7100
Bis(N,N'-di-sec-butylacetamidinato)dicopper(I), 99% 695188-31-9
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Close Section Gadolinium › Compounds
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Catalog Number   Description CAS Number
64-3575 64-3575
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Tris(N,N'-di-i-propylformamidinato)gadolinium(III), (99.999+%-Gd) PURATREM Gd-FMD
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Close Section Iron › Compounds
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Catalog Number   Description CAS Number
26-0145 26-0145
Bis(N,N'-di-t-butylacetamidinato)iron (II), min. 98% 635680-56-7
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Close Section Lanthanum › Compounds
Close Section Lithium › Compounds
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Catalog Number   Description CAS Number
03-8000 03-8000
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(N,N-Di-i-propylacetamidinato)lithium, min. 97% (99.99+%-Li) PURATREM
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Close Section Lutetium › Compounds
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Catalog Number   Description CAS Number
71-1050 71-1050
Tris(N,N'-di-i-propylacetamidinato)lutetium(III), 99%
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Close Section Magnesium › Compounds
Close Section Manganese › Compounds
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Catalog Number   Description CAS Number
25-0230 25-0230
Bis(N,N'-di-i-propylpentylamidinato)manganese(II), min. 98% 1188406-04-3
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Close Section Nickel › Compounds
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Catalog Number   Description CAS Number
28-0045 28-0045
Bis(N,N'-di-t-butylacetamidinato)nickel(II), (99.999%-Ni) PURATREM 940895-79-4
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Close Section Ruthenium › Compounds
Close Section Scandium › Compounds
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Catalog Number   Description CAS Number
21-1200 21-1200
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Tris(N,N'-di-i-propylformamidinato)scandium(III), (99.9%-Sc)
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Close Section Tin › Compounds
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Catalog Number   Description CAS Number
50-1170 50-1170
Bis(N,N'-di-i-propylacetamidinato)tin(II), 99% 1421599-46-3
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Close Section Ytterbium › Compounds
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Catalog Number   Description CAS Number
70-1000 70-1000
Tris(N,N'-di-i-propylacetamidinato)ytterbium(III), 99%
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Close Section Yttrium › Compounds
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Catalog Number   Description CAS Number
39-1550 39-1550
Tris(N,N'-di-i-propylformamidinato)yttrium(III), 97%
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Close Section Product Resources › Documents
Close Section Product Blogs › Documents
Blog Title Link
A New Lithium Precursor Is Available As An ALD Source For Li Films With Applications In Battery Technology
High Purity Chemicals for Materials R&D
Lanthanum and Lutetium Amidinate Precursors are Used to Grow Desirable High-k Ternary Oxides by Atomic Layer Deposition
Chlorine-free titanium ALD precursor for leading edge semiconductor applications
Ytterbium Precursors for ALD Growth Applications in the Fabrication of Advanced Optical and Electrical Devices
PEALD processes employing Strem supplied TDMASn precursor presented by diverse groups of researchers
A New Yttrium Amidinate Precursor for the ALD growth of Oxide Thin Films for Advanced Electronic Applications
2019 MRS Fall Meeting & Exhibit
Tin (II) Amidinate Shows Potential as an ALD Precursor for Microelectronic and Optical Applications
V2019- Vakuum & Plasma Conference
A Scandium Source for ALD of Thin Film Oxides
Strem’s High Purity Liquid Ruthenium Precursor for Emerging ALD and CVD Applications
CVD/ALD Bubblers & Ampoules for R&D and High-Volume Manufacturing
Strem Offers New La-FMD ALD Precursor for Future Leading Edge Logic and Memory Products
A New Calcium Amidinate Precursor for Atomic Layer Deposition (ALD) of Calcium Sulfide and Oxide Films.
Estimating Rising Demand for Ru Thin-films in the Next Generation Chips
The AVS 65th International Symposium & Exhibition begins next week!
Countdown to ALD 2018!
Novel Precursor for CVD/ALD of Ruthenium Containing Films
A Volatile Manganese Precursor for ALD & CVD, 25-0230: Bis(N,N'-di-i-propylpentylamidinato)manganese(II)
SEMICON West 2016
Families of Volatile Metal Precursors from Roy Gordon’s Group at Harvard University for Use in ALD Applications
26-0145: An Air Sensitive Volatile Precursor for MOCVD and ALD Applications
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