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You searched for “Metal alkoxides”

Aluminum › Compounds

Catalog Number	Description	CAS Number
View Structures
93-1308	Aluminum s-butoxide, 98%	2269-22-9
93-1370	Aluminum ethoxide, 99%	555-75-9
93-1345	Aluminum i-propoxide, 98+%	555-31-7
13-1600	Dimethylaluminum i-propoxide, 98% (99.99+%-Al) PURATREM	6063-89-4

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93-1308 2269-22-9	93-1370 555-75-9	93-1345 555-31-7
13-1600 6063-89-4

Antimony › Compounds

Catalog Number	Description	CAS Number
View Structures
93-5113	Antimony(III) n-butoxide, 99%	2155-74-0
93-5115	Antimony(III) ethoxide, 99%	10433-06-4

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93-5113 2155-74-0	93-5115 10433-06-4

Copper › Compounds

Catalog Number		Description	CAS Number
View Structures
29-7120		Bis(dimethylamino-2-propoxy)copper(II), min. 97% Cu(dmap)2	185827-91-2

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29-7120 185827-91-2

Germanium › Compounds

Catalog Number		Description	CAS Number
View Structures
93-3206		Germanium(IV) ethoxide (99.99+%-Ge) PURATREM	14165-55-0

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93-3206 14165-55-0

Hafnium › Compounds

Catalog Number	Description	CAS Number
View Structures
72-5800	Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)	2172-02-3
72-5900	Hafnium(IV) ethoxide, 99%	13428-80-3

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72-5800 2172-02-3	72-5900 13428-80-3

Lanthanum › Compounds

Catalog Number		Description	CAS Number
View Structures
57-2550		Lanthanum(III) i-propoxide, 99% (99.9%-La) (REO)	19446-52-7

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57-2550 19446-52-7

Lead › Compounds

Catalog Number		Description	CAS Number
View Structures
82-2155		Bis(1-dimethylamino-2-methyl-2-propanolate)lead(II), 98% Pb(DMAMP)2	934302-16-6

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82-2155 934302-16-6

Nickel › Compounds

Catalog Number		Description	CAS Number
View Structures
28-1301		Bis(cyclopentadienyl)nickel, 99% (Nickelocene)	1271-28-9

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28-1301 1271-28-9

Niobium › Compounds

Catalog Number		Description	CAS Number
View Structures
93-4104		Niobium(V) ethoxide (99.9+%-Nb)	3236-82-6

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93-4104 3236-82-6

Silicon › Compounds

Catalog Number	Description	CAS Number
View Structures
93-1451	Tetrabutoxysilane, min. 97%	4766-57-8
93-1454	Tetraethoxysilane, min. 98% TEOS	78-10-4
93-1459	Tetramethoxysilane, 98%	681-84-5
14-7015	Tri-t-butoxysilanol (99.999%-Si) PURATREM	18166-43-3
14-7020	Tri-t-pentoxysilanol (99.999%-Si) PURATREM	17906-35-3

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93-1451 4766-57-8	93-1454 78-10-4	93-1459 681-84-5
14-7015 18166-43-3	14-7020 17906-35-3

Tantalum › Compounds

Catalog Number	Description	CAS Number
View Structures
93-7303	Tantalum(V) ethoxide (99.99+%-Ta) PURATREM	6074-84-6
73-1080	Tantalum(V) ethoxide (99.9999%-Ta) PURATREM	6074-84-6
93-7329	Tantalum(V) methoxide (99.99+%-Ta) PURATREM	865-35-0

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93-7303 6074-84-6	73-1080 6074-84-6	93-7329 865-35-0

Thallium › Compounds

Catalog Number		Description	CAS Number
View Structures
93-8105		Thallium(I) ethoxide, min. 95%	20398-06-5

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93-8105 20398-06-5

Tin › Compounds

Catalog Number		Description	CAS Number
View Structures
50-2100		Tin(IV) t-butoxide (99.99%-Sn) PURATREM	36809-75-3

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50-2100 36809-75-3

Titanium › Compounds

Catalog Number	Description	CAS Number
View Structures
93-2204	Titanium(IV) n-butoxide, 98+%	5593-70-4
22-1170	Titanium(IV) t-butoxide (99.95%-Ti)	3087-39-6
22-2209	Titanium(IV) ethoxide (99.99%-Ti) PURATREM	3087-36-3
93-2216	Titanium(IV) i-propoxide, min. 98%	546-68-9
98-4030	Titanium(IV) i-propoxide, min. 98%, 93-2216, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD	546-68-9

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93-2204 5593-70-4	22-1170 3087-39-6	22-2209 3087-36-3
93-2216 546-68-9	98-4030 546-68-9

Vanadium › Compounds

Catalog Number		Description	CAS Number
View Structures
23-5000		Vanadium (V) tri-i-propoxy oxide, 98+% VTIP	5588-84-1

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23-5000 5588-84-1

Zirconium › Compounds

Catalog Number	Description	CAS Number
View Structures
40-1749	Zirconium(IV) t-butoxide, 98%	2081-12-1
40-1750	Zirconium(IV) t-butoxide (99.99%-Zr) PURATREM	2081-12-1
93-4043	Zirconium(IV) ethoxide, 99+%	18267-08-8

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40-1749 2081-12-1	40-1750 2081-12-1	93-4043 18267-08-8

Product Blogs › Documents

Blog Title	Link
CALLERY™ HMDS Bases with High Purity and Consistent Quality	View
CALLERY™ Alkali Metal Alkoxides for Organic Synthesis	View
High-Performance Precursors for CVD & ALD	View
Chlorine-free titanium ALD precursor for leading edge semiconductor applications	View
PEALD processes employing Strem supplied TDMASn precursor presented by diverse groups of researchers	View
Strem’s High Purity Liquid Ruthenium Precursor for Emerging ALD and CVD Applications	View
CVD/ALD Bubblers & Ampoules for R&D and High-Volume Manufacturing	View
A New Calcium Amidinate Precursor for Atomic Layer Deposition (ALD) of Calcium Sulfide and Oxide Films.	View

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